About layout size and Mash size
I am currently running a Si waveguide grating simulation. I am facing some problems and appreciate any hints from you.
1. The layout size: I am trying to put the whole design into a window as small as possible. However, it seems to be that for different size of the layout, the simulation results are different (I am using the same Mash size). Sometimes it could be a big difference. And it also seems the observation plane can not be too close to the boundary. Otherwise, the reading could be completely misleading. Is this true? And is there anything to do with the boundary condition?
2. About the mash size: I am currently using the default mash size which is approx. 45nm. However, when choosing the smaller or larger mash size, readings such as the angle of diffraction (from a Si grating) could be varied. I am wondering, in general, is mash size the smaller the better/more precise? Or there will be big accumulated error when choosing smaller mash size? If so, dose it mean for each of design, the mash size needs to be tested and chosen within a certain range which may lead to a more precise result?
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